JIS K0160-2009 表面化学分析.从硅片加工基准材料的表面上收集元素和化学方法及其通过总反射X射线荧光(TXRF)分光光度法的测定
Surface chemical analysis -- Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy