ZH
RU
ES

Tertiary ion trap mass spectrometry

Tertiary ion trap mass spectrometry, Total:70 items.

In the international standard classification, Tertiary ion trap mass spectrometry involves: Analytical chemistry, Beverages, Testing of metals, Water quality, Microbiology, Semiconducting materials, Vocabularies, Nuclear energy engineering, Optics and optical measurements, Farming and forestry, Non-ferrous metals, Lubricants, industrial oils and related products, Ceramics.

Zhejiang Provincial Standard of the People's Republic of China, Tertiary ion trap mass spectrometry

DB33/T 543-2005 Method for Determination of Multi-residue Pesticides in Fruits and Vegetables by Gas Chromatography Ion Trap Mass Spectrometry

American Society for Testing and Materials (ASTM), Tertiary ion trap mass spectrometry

ASTM E1504-92(1996) Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1504-92(2001) Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1504-06 Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1504-11 Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1635-06(2011) Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1635-06 Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1881-12 Standard Guide for Cell Culture Analysis with SIMS
ASTM E1438-91(2001) Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
ASTM E1438-91(1996) Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
ASTM E1881-06 Standard Guide for Cell Culture Analysis with SIMS
ASTM E1438-06 Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
ASTM F1366-92(1997)e1 Standard Test Method for Measuring Oxygen Concentration in Heavily Doped Silicon Substrates by Secondary Ion Mass Spectrometry
ASTM C1287-10 Standard Test Method for Determination of Impurities in Nuclear Grade Uranium Compounds by Inductively Coupled Plasma Mass Spectrometry
ASTM C1287-18 Standard Test Method for Determination of Impurities in Nuclear Grade Uranium Compounds by Inductively Coupled Plasma Mass Spectrometry
ASTM E1880-06 Standard Practice for Tissue Cryosection Analysis with SIMS
ASTM E1880-12 Standard Practice for Tissue Cryosection Analysis with SIMS
ASTM E1162-06 Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM E1162-11 Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
ASTM F1617-98 Standard Test Method for Measuring Surface Sodium, Aluminum, Potassium, and Iron on Silicon and EPI Substrates by Secondary Ion Mass Spectrometry
ASTM C1474-00(2011) Standard Test Method for Analysis of Isotopic Composition of Uranium in Nuclear-Grade Fuel Material by Quadrupole Inductively Coupled Plasma-Mass Spectrometry
ASTM C1474-00 Standard Test Method for Analysis of Isotopic Composition of Uranium in Nuclear-Grade Fuel Material by Quadrupole Inductively Coupled Plasma-Mass Spectrometry
ASTM C1474-00(2006)e1 Standard Test Method for Analysis of Isotopic Composition of Uranium in Nuclear-Grade Fuel Material by Quadrupole Inductively Coupled Plasma-Mass Spectrometry
ASTM E2426-10 Standard Practice for Pulse Counting System Dead Time Determination by Measuring Isotopic Ratios with SIMS
ASTM C1474-19 Standard Test Method for Analysis of Isotopic Composition of Uranium in Nuclear-Grade Fuel Material by Quadrupole Inductively Coupled Plasma-Mass Spectrometry

British Standards Institution (BSI), Tertiary ion trap mass spectrometry

BS ISO 23830:2008 Surface chemical analysis - Secondary-ion mass spectrometry - Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
BS ISO 18114:2003 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
BS ISO 17862:2013 Surface chemical analysis. Secondary ion mass spectrometry. Linearity of intensity scale in single ion counting time-of-flight mass analysers
BS ISO 23812:2009 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth calibration for silicon using multiple delta-layer reference materials
23/30425527 DC BS ISO 24384. Water quality. Determination of chromium(VI) and chromium(III) in water. Method using liquid chromatography with inductively coupled plasma mass spectrometry (LC-ICP-MS) after chelating pretreatment
BS ISO 20341:2003 Surface chemical analysis - Secondary-ion mass spectrometry - Method for estimating depth resolution parameters with multiple delta-layer reference materials
BS EN ISO 18635:2016 Water quality. Determination of short-chain polychlorinated alkanes (SCCPs) in sediment, sewage sludge and suspended (particulate) matter. Method using gas chromatography-mass spectrometry (GC-MS) and electron capture negative ionization (ECNI)

Group Standards of the People's Republic of China, Tertiary ion trap mass spectrometry

T/NAIA 0160-2022 Determination of total sulfur dioxide in wine by triple quadrupole inductively coupled plasma mass spectrometry
T/NAIA 0158-2022 Determination of 6 Metal Elements in Soil Two-step Supermicrowave Digestion-Inductively Coupled Plasma Mass Spectrometry

International Organization for Standardization (ISO), Tertiary ion trap mass spectrometry

ISO 23830:2008 Surface chemical analysis - Secondary-ion mass spectrometry - Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
ISO 18114:2003 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
ISO 18114:2021 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
ISO 20341:2003 Surface chemical analysis - Secondary-ion mass spectrometry - Method for estimating depth resolution parameters with multiple delta-layer reference materials
ISO 23812:2009 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth calibration for silicon using multiple delta-layer reference materials
ISO 18635:2016 Water quality - Determination of short-chain polychlorinated alkanes (SCCPs) in sediment, sewage sludge and suspended (particulate) matter - Method using gas chromatography-mass spectrometry (GC-MS) and electron capture negative ionization (ECNI)
ISO 3169:2023 Fine ceramics (advanced ceramics, advanced technical ceramics) — Methods for chemical analysis of impurities in aluminium oxide powders using inductively coupled plasma-optical emission spectrometry

Association Francaise de Normalisation, Tertiary ion trap mass spectrometry

NF X21-064*NF ISO 23830:2009 Surface chemical analysis - Secondary-ion mass spectrometry - Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry.
NF T90-046:2014 Water quality - Determination of short-chain polychlorinated alkanes (SCCPs) in water - Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI)
NF ISO 23812:2009 Analyse chimique des surfaces - Spectrométrie de masse des ions secondaires - Méthode pour l'étalonnage de la profondeur pour le silicium à l'aide de matériaux de référence à couches delta multiples
NF X21-066*NF ISO 23812:2009 Surface chemical analysis - Secondary ion mass spectrometry - Method for depth calibration for silicon using multiple delta-layer reference materials
NF ISO 5724:2023 Joaillerie, bijouterie et métaux précieux - Dosage de l'or de très haute pureté - Méthode par différence utilisant la spectrométrie de masse à plasma à couplage inductif (ICP-MS)

Professional Standard - Non-ferrous Metal, Tertiary ion trap mass spectrometry

YS/T 980-2014 Determination of impurities of high purity gallium oxide.Inductively coupled plasma-mass spectrmetry
YS/T 928.5-2013 Methods for chemical analysis of nickel cobalt manganese composite hydroxide.Part 5:Determination of lead contents.Inductively coupled plasma mass spectrometry

Professional Standard - Commodity Inspection, Tertiary ion trap mass spectrometry

SN/T 3334.2-2013 Determination of triphenyltin and butyltin trichloride in the household appliances.LC-ICP-MS

Korean Agency for Technology and Standards (KATS), Tertiary ion trap mass spectrometry

KS D ISO 18114:2005 Surface chemical analysis－Secondary-ion mass spectrometry－Determination of relative sensitivity factors from ion-implanted reference materials
KS D ISO 14237:2003 Surface chemical analysis－Secondary-ion mass spectrometry－Determination of boron atomic concentration in silicon using uniformly doped materials
KS D ISO 20341:2005 Surface chemical analysis－Secondary-ion mass spectrometry－Method for estimating depth resolution parameters with multiple delta-layer reference materials

Japanese Industrial Standards Committee (JISC), Tertiary ion trap mass spectrometry

JIS K 0163:2010 Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of relative sensitivity factors from ion-implanted reference materials
JIS K 0143:2000 Surface chemical analysis -- Secondary ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials

国家市场监督管理总局、中国国家标准化管理委员会, Tertiary ion trap mass spectrometry

GB/T 37049-2018 Test method for the content of metal impurity in electronic grade polysilicon—Inductively coupled-plasma mass spectrometry method

Yunnan Provincial Standard of the People's Republic of China, Tertiary ion trap mass spectrometry

DB53/T 501-2013 Inductively Coupled Plasma Mass Spectrometry for Determination of Trichlorosilane Impurity Element Content in Polysilicon

Standard Association of Australia （SAA）, Tertiary ion trap mass spectrometry

AS ISO 22048:2006 Surface chemical analysis - Information format for static secondary-ion mass spectrometry
AS ISO 18114:2006 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
AS ISO 17560:2006 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon
AS ISO 14237:2006 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials

Professional Standard - Environmental Protection, Tertiary ion trap mass spectrometry

HJ 1074-2019 Water Quality Determination of 4 Organotin Compounds including Tributyltin by Liquid Chromatography-Inductively Coupled Plasma Mass Spectrometry
HJ 1050-2019 Determination of chlorate, chlorite, bromate, dichloroacetic acid and trichloroacetic acid in water by ion chromatography

Jilin Provincial Standard of the People's Republic of China, Tertiary ion trap mass spectrometry

DB22/T 2465-2016 Determination of triazotin and fenbutyltin residues in water by liquid chromatography-inductively coupled plasma mass spectrometry

Professional Standard - Agriculture, Tertiary ion trap mass spectrometry

空气和废气监测分析方法 3.2.13-2003 Part Three Air Quality Monitoring Chapter Two Particulate Matter and Its Elements Thirteen Inductively Coupled Plasma Atomic Emission Spectrometry (ICP-AES)

General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China, Tertiary ion trap mass spectrometry

GB/T 32281-2015 Test method for measuring oxygen, carbon, boron and phosphorus in solar silicon wafers and feedstock.Secondary ion mass spectrometry
GB/T 29056-2012 Trichlorosilane for silicon epitaxy.Determination of boron,aluminium,phosphorus,vanadium,chrome,manganese,iron,cobalt,nickel,copper,arsenic,molybdenum and antimony content.Inductively coupled plasma mass spectrometric method

Professional Standard - Military and Civilian Products, Tertiary ion trap mass spectrometry

WJ 2122-1993 Determination of water quality 2,4-dihydroxy-1,3,5-trinitrobenzene (stephanic acid) by reversed-phase ion-pair liquid chromatography

German Institute for Standardization, Tertiary ion trap mass spectrometry

DIN EN ISO 12010:2014 Water quality - Determination of short-chain polychlorinated alkanes (SCCPs) in water - Method using gas chromatography-mass spectrometry (GC-MS) and negative-ion chemical ionization (NCI) (ISO 12010:2012); German version EN ISO 12010:2014

Professional Standard - Nuclear Industry, Tertiary ion trap mass spectrometry

EJ/T 20163-2018 Determination of twenty-eight impurity elements such as silver in post-processed uranium trioxide powder by inductively coupled plasma atomic emission spectrometry

国家质量监督检验检疫总局, Tertiary ion trap mass spectrometry

SN/T 4759-2017 Determination method of antimony, arsenic, cadmium, lead, mercury and selenium in imported food grade lubricating oil (grease) Inductively coupled plasma mass spectrometry (ICP-MS)