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Mass Spectrometer Secondary Ion Mass Spectrometer

Mass Spectrometer Secondary Ion Mass Spectrometer, Total:105 items.

In the international standard classification, Mass Spectrometer Secondary Ion Mass Spectrometer involves: Analytical chemistry, Laboratory medicine, Testing of metals, Semiconducting materials, Semiconductor devices, Animal feeding stuffs, Water quality, Electricity. Magnetism. Electrical and magnetic measurements, General methods of tests and analysis for food products, Microbiology.


国家市场监督管理总局、中国国家标准化管理委员会, Mass Spectrometer Secondary Ion Mass Spectrometer

  • GB/T 40129-2021 Surface chemical analysis—Secondary ion mass spectrometry—Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
  • GB/T 39144-2020 Test method for magnesium content in gallium nitride materials—Secondary ion mass spectrometry
  • GB/T 41153-2021 Determination of boron, aluminum and nitrogen impurity content in silicon carbide single crystal—Secondary ion mass spectrometry
  • GB/T 40109-2021 Surface chemical analysis—Secondary-ion mass spectrometry—Method for depth profiling of boron in silicon

International Organization for Standardization (ISO), Mass Spectrometer Secondary Ion Mass Spectrometer

  • ISO 13084:2018 Surface chemical analysis — Secondary ion mass spectrometry — Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
  • ISO 13084:2011 Surface chemical analysis - Secondary-ion mass spectrometry - Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
  • ISO/TS 22933:2022 Surface chemical analysis — Secondary ion mass spectrometry — Method for the measurement of mass resolution in SIMS
  • ISO 178:1975 Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
  • ISO 17862:2013 Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
  • ISO 178:2019 Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
  • ISO 17862:2022 Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
  • ISO 20411:2018 Surface chemical analysis - Secondary ion mass spectrometry - Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
  • ISO 22048:2004 Surface chemical analysis — Information format for static secondary-ion mass spectrometry
  • ISO 14237:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
  • ISO 14237:2000 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
  • ISO 12406:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of arsenic in silicon
  • ISO 17560:2014 Surface chemical analysis — Secondary-ion mass spectrometry — Method for depth profiling of boron in silicon
  • ISO 23830:2008 Surface chemical analysis - Secondary-ion mass spectrometry - Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry

Japanese Industrial Standards Committee (JISC), Mass Spectrometer Secondary Ion Mass Spectrometer

  • JIS K 0157:2021 Surface chemical analysis -- Secondary ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
  • JIS K 0158:2021 Surface chemical analysis -- Secondary ion mass spectrometry -- Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
  • JIS K 0155:2018 Surface chemical analysis -- Secondary ion mass spectrometry -- Linearity of intensity scale in single ion counting time-flight mass analysers
  • JIS K 0153:2015 Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
  • JIS K 0168:2011 Surface chemical analysis -- Information format for static secondary-ion mass spectrometry
  • JIS K 0164:2023 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon
  • JIS K 0143:2023 Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials

British Standards Institution (BSI), Mass Spectrometer Secondary Ion Mass Spectrometer

  • BS ISO 13084:2018 Tracked Changes. Surface chemical analysis. Secondary ion mass spectrometry. Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
  • BS ISO 13084:2011 Surface chemical analysis. Secondary-ion mass spectrometry. Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
  • BS ISO 20411:2018 Surface chemical analysis. Secondary ion mass spectrometry. Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
  • BS ISO 17862:2022 Surface chemical analysis. Secondary ion mass spectrometry. Linearity of intensity scale in single ion counting time-of-flight mass analysers
  • 20/30409963 DC BS ISO 17862. Surface chemical analysis. Secondary ion mass spectrometry. Linearity of intensity scale in single ion counting time-of-flight mass analysers
  • BS ISO 22048:2004 Surface chemical analysis. Information format for static secondary-ion mass spectrometry
  • BS ISO 14237:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
  • BS ISO 23830:2008 Surface chemical analysis - Secondary-ion mass spectrometry - Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
  • BS ISO 12406:2010 Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of arsenic in silicon
  • BS EN 16215:2012 Animal feeding stuffs. Determination of dioxins and dioxin-like PCBs by GC/HRMS and of indicator PCBs by GC/HRMS
  • 20/30409889 DC BS ISO 18114. Surface chemical analysis. Secondary-ion mass spectrometry. Determination of relative sensitivity factors from ion-implanted reference materials
  • BS ISO 18114:2021 Tracked Changes. Surface chemical analysis. Secondary-ion mass spectrometry. Determination of relative sensitivity factors from ion-implanted reference materials
  • BS ISO 22048:2005 Surface chemical analysis - Information format for static secondary-ion mass spectrometry
  • BS ISO 17862:2013 Surface chemical analysis. Secondary ion mass spectrometry. Linearity of intensity scale in single ion counting time-of-flight mass analysers
  • BS ISO 18114:2003 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials

Group Standards of the People's Republic of China, Mass Spectrometer Secondary Ion Mass Spectrometer

  • T/CIMA 0019-2019 Proton transfer reaction mass spectrometers
  • T/CIMA 0023-2020 Technical requirements for vehicle-mounted inductively coupled plasma quadrupole mass spectrometer
  • T/CASAS 010-2019 Determination of Trace Impurities Concentration and Distribution in GaN Materials by Secondary Ion Mass Spectrometry
  • T/CASAS 009-2019 Determination of Trace Impurities Concentration and Distribution in Semi-insulating SiC Materials by Secondary Ion Mass Spectrometry

American Society for Testing and Materials (ASTM), Mass Spectrometer Secondary Ion Mass Spectrometer

  • ASTM E1504-11(2019) Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
  • ASTM E2695-09 Standard Guide for Interpretation of Mass Spectral Data Acquired with Time-of-Flight Secondary Ion Mass Spectroscopy
  • ASTM F1366-92(1997)e1 Standard Test Method for Measuring Oxygen Concentration in Heavily Doped Silicon Substrates by Secondary Ion Mass Spectrometry
  • ASTM E1504-92(1996) Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
  • ASTM E1504-92(2001) Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
  • ASTM E1162-87(2001) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
  • ASTM E1162-87(1996) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
  • ASTM E1504-06 Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
  • ASTM E1504-11 Standard Practice for Reporting Mass Spectral Data in Secondary Ion Mass Spectrometry (SIMS)
  • ASTM E1635-95(2000) Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)
  • ASTM E1635-06(2019) Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)
  • ASTM E1635-06(2011) Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)
  • ASTM D5673-03 Standard Test Method for Elements in Water by Inductively Coupled Plasma8212;Mass Spectrometry
  • ASTM D5673-05 Standard Test Method for Elements in Water by Inductively Coupled Plasma-Mass Spectrometry
  • ASTM D5673-96 Standard Test Method for Elements in Water by Inductively Coupled Plasma8212;Mass Spectrometry
  • ASTM D5673-02 Standard Test Method for Elements in Water by Inductively Coupled Plasma8212;Mass Spectrometry
  • ASTM E1162-11(2019) Standard Practice for Reporting Sputter Depth Profile Data in Secondary Ion Mass Spectrometry (SIMS)
  • ASTM E1016-07(2020) Standard Guide for Literature Describing Properties of Electrostatic Electron Spectrometers
  • ASTM E1635-06 Standard Practice for Reporting Imaging Data in Secondary Ion Mass Spectrometry (SIMS)
  • ASTM E1881-12 Standard Guide for Cell Culture Analysis with SIMS
  • ASTM E1438-91(2001) Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
  • ASTM E1438-91(1996) Standard Guide for Measuring Widths of Interfaces in Sputter Depth Profiling Using SIMS
  • ASTM E1881-06 Standard Guide for Cell Culture Analysis with SIMS

Association Francaise de Normalisation, Mass Spectrometer Secondary Ion Mass Spectrometer

  • NF ISO 23830:2009 Analyse chimique des surfaces - Spectrométrie de masse des ions secondaires - Répétabilité et constance de l'échelle des intensités relatives en spectrométrie statique de masse des ions secondaires
  • NF X20-352:1976 Dioxide sulphur determination by mass spectrometry.
  • NF X21-070*NF ISO 14237:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials.
  • NF X21-064*NF ISO 23830:2009 Surface chemical analysis - Secondary-ion mass spectrometry - Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry.
  • NF EN 15111:2007 Produits alimentaires - Dosage des éléments traces - Dosage de l'iode par spectrométrie d'émission avec plasma induit par haute fréquence et spectromètre de masse (ICP-SM)
  • NF ISO 17560:2006 Analyse chimique des surfaces - Spectrométrie de masse des ions secondaires - Dosage du bore dans le silicium par profilage d'épaisseur
  • NF ISO 14237:2010 Analyse chimique des surfaces - Spectrométrie de masse des ions secondaires - Dosage des atomes de bore dans le silicium à l'aide de matériaux dopés uniformément

国家药监局, Mass Spectrometer Secondary Ion Mass Spectrometer

  • YY/T 1740.2-2021 Medical Mass Spectrometry Part 2: Matrix-Assisted Laser Desorption Ionization Time-of-Flight Mass Spectrometry

General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China, Mass Spectrometer Secondary Ion Mass Spectrometer

  • GB/T 42263-2022 Determination of nitrogen content in silicon single crystal—Secondary ion mass spectrometry method
  • GB/T 25186-2010 Surface chemical analysis.Secondary-ion mass spectrometry.Determination of relative sensitivity factors from ion-implanted reference materials
  • GB/T 24582-2009 Test method for measuring surface metal contamination of polycrystalline silicon by acid extraction-inductively coupled plasma mass spectrometry
  • GB/T 32495-2016 Surface chemical analysis.Secondary-ion mass spectrometry.Method for depth profiling of arsenic in silicon
  • GB/T 24580-2009 Test method for measuring Boron contamination in heavily doped n-type silicon substrates by secondary ion mass spectrometry
  • GB/T 20176-2006 Surface chemical analysis.Secondary-ion mass spectrometry.Determination of boron atomic concentration in silicon using uniformly doped materials
  • GB/T 24575-2009 Test method for measuring surface sodium, aluminum, potassium, and iron on silicon and epi substrates by secondary ion mass spectrometry
  • GB/T 29851-2013 Test method for measuring boron and aluminium in silicon materials used for photovoltaic applications by secondary ion mass spectrometry
  • GB/T 29852-2013 Test method for measuring phosphorus, arsenic and antimony in silicon materials used for photovoltaic applications by secondary ion mass spectrometry
  • GB/T 22572-2008 A Method for Estimating Depth-Resolved Parameters Using Multi-delta Layered Reference Materials for Secondary Ion Mass Spectrometry in Surface Chemistry
  • GB/T 32281-2015 Test method for measuring oxygen, carbon, boron and phosphorus in solar silicon wafers and feedstock.Secondary ion mass spectrometry
  • GB/T 42274-2022 Determination of the content and distribution of trace elements (magnesium, gallium) in aluminum nitride materials—Secondary ion mass spectrometry

Professional Standard - Electron, Mass Spectrometer Secondary Ion Mass Spectrometer

  • SJ/T 11493-2015 Test method for measuring nitrogen concentration in silicon substrates by secondary ion mass spectrometry
  • SJ/T 11498-2015 Test method for measuring oxygen contamination in heavily doped silicon substrates by secondary ion mass spectrometry

National Metrological Technical Specifications of the People's Republic of China, Mass Spectrometer Secondary Ion Mass Spectrometer

  • JJF 1159-2006 Calibration Specification for Quadrupole Inductively Coupled Plasma Mass Spectrometers

Korean Agency for Technology and Standards (KATS), Mass Spectrometer Secondary Ion Mass Spectrometer

  • KS D ISO 22048-2005(2020) Surface chemical analysis - Information format for static secondary-ion mass spectrometry
  • KS D ISO 18114-2005(2020) Surface chemical analysis-Secondary-ion mass spectrometry-Determination of relative sensitivity factors from ion-implanted reference materials
  • KS D ISO 20341-2005(2020) Surface chemical analysis-Secondary-ion mass spectrometry-Method for estimating depth resolution parameters with multiple delta-layer reference materials
  • KS D ISO 22048:2005 Surface chemical analysis - Information format for static secondary-ion mass spectrometry

未注明发布机构, Mass Spectrometer Secondary Ion Mass Spectrometer

  • BS ISO 22048:2004(2005) Surface chemical analysis — Information format for static secondary - ion mass spectrometry

Professional Standard - Agriculture, Mass Spectrometer Secondary Ion Mass Spectrometer

中华人民共和国国家质量监督检验检疫总局、中国国家标准化管理委员会, Mass Spectrometer Secondary Ion Mass Spectrometer

  • GB/T 34826-2017 Method of performance testing for quadrupole inductively coupled plasma mass spectrometer

KR-KS, Mass Spectrometer Secondary Ion Mass Spectrometer

German Institute for Standardization, Mass Spectrometer Secondary Ion Mass Spectrometer

  • DIN EN 16215:2012 Animal feeding stuffs - Determination of dioxins and dioxin-like PCBs by GC/HRMS and of indicator PCBs by GC/HRMS; German version EN 16215:2012

国家质量监督检验检疫总局, Mass Spectrometer Secondary Ion Mass Spectrometer

  • SN/T 4585-2016 Determination of methylarsonic acid and dimethylarsinic acid residues in exported foods by liquid chromatography-inductively coupled plasma mass spectrometry

Professional Standard - Non-ferrous Metal, Mass Spectrometer Secondary Ion Mass Spectrometer

  • YS/T 980-2014 Determination of impurities of high purity gallium oxide.Inductively coupled plasma-mass spectrmetry

Standard Association of Australia (SAA), Mass Spectrometer Secondary Ion Mass Spectrometer

  • AS ISO 22048:2006 Surface chemical analysis - Information format for static secondary-ion mass spectrometry




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