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Surface Atomic Energy Spectroscopy

Surface Atomic Energy Spectroscopy, Total:419 items.

In the international standard classification, Surface Atomic Energy Spectroscopy involves: Analytical chemistry, Linear and angular measurements, Semiconducting materials, Surface treatment and coating, Ferrous metals, Optics and optical measurements, Water quality, Test conditions and procedures in general, Sports equipment and facilities, Metrology and measurement in general, Products of the chemical industry, Radiation measurements, Nuclear energy engineering, Measurement of force, weight and pressure, Non-ferrous metals, Testing of metals, Semiconductor devices, Ceramics, Road engineering, Clothes, Coatings and related processes used in aerospace industry, Hydraulic energy engineering, Electrical and electronic testing, Rubber, Non-destructive testing, Glass, Applications of information technology, Solar energy engineering, Radiation protection, Sterilization and disinfection, Products of non-ferrous metals.


国家市场监督管理总局、中国国家标准化管理委员会, Surface Atomic Energy Spectroscopy

  • GB/T 41072-2021 Surface chemical analysis—Electron spectroscopies—Guidelines for ultraviolet photoelectron spectroscopy analysis
  • GB/T 41073-2021 Surface chemical analysis—Electron spectroscopies—Minimum reporting requirements for peak fitting in X-ray photoelectron spectroscopy
  • GB/T 36504-2018 Guide for the analysis of the printed circuit board surface contamination—Auger electron spectroscopy
  • GB/T 36401-2018 Surface chemical analysis—X-ray photoelectron spectroscopy—Reporting of results of thin-film analysis
  • GB/T 29732-2021 Surface chemical analysis—Medium resolution auger electron spectrometers—Calibration of energy scales for elemental analysis
  • GB/T 41064-2021 Surface chemical analysis—Depth profiling—Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
  • GB/T 40129-2021 Surface chemical analysis—Secondary ion mass spectrometry—Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
  • GB/T 40109-2021 Surface chemical analysis—Secondary-ion mass spectrometry—Method for depth profiling of boron in silicon
  • GB/T 39145-2020 Test method for the content of surface metal elements on silicon wafers—Inductively coupled plasma mass spectrometry
  • GB/T 40128-2021 Surface chemical analysis—Atomic force microscopy—Test method for thickness of the two-dimensional layered molybdenum disulfide nanosheets

General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China, Surface Atomic Energy Spectroscopy

  • GB/T 25187-2010 Surface chemical analysis.Auger electron spectroscopy.Description of selected instrumental performance parameters
  • GB/T 28632-2012 Surface chemical analysis.Auger electron spectroscopy and X-ray photoelectron spectroscopy.Determination of lateral resolution
  • GB/T 21006-2007 Surface chemical analysis.X-ray photoelectron and Auger electron spectrometers.Linearity of intensity scale
  • GB/T 28892-2012 Surface chemical analysis.X-ray photoelectron spectroscopy.Description of seleted instrumental performance parameters
  • GB/T 30704-2014 Surface chemical analysis.X-ray photoelectron spectroscopy.Guidelines for analysis
  • GB/T 24579-2009 Test methods for measuring surface metal contamination of polycrystalline silicon by acid extraction-atomic absorption spectroscopy
  • GB/T 22571-2008 Surface chemical analysis.X-ray photoelectron spectrometers.Calibration of energy scales
  • GB/Z 32494-2016 Analysis of Surface Chemical Analysis Auger Electron Spectroscopy Chemical Information Interpretation
  • GB/T 29556-2013 Surface chemical analysis.Auger electron spectroscopy and X-ray photoelectron spectroscopy.Determination of lateral resolution,analysis area,and sample area viewed by the analyser
  • GB/Z 32490-2016 Procedure for determination of background by X-ray photoelectron spectroscopy for surface chemical analysis
  • GB/T 32266-2015 Method of performance testing for atomic fluorescence spectrometer
  • GB/T 20176-2006 Surface chemical analysis.Secondary-ion mass spectrometry.Determination of boron atomic concentration in silicon using uniformly doped materials
  • GB/T 24514-2009 Zinc and/or aluminium based coatings on steel.Determination of coating mass per unit area and chemical composition.Gravimetry,inductively coupled plasma atomic emission spectrometry and flame atomic absorption spectrometry
  • GB/T 24916-2010 Surface treatment solution.Determination of metal element contents.Inductively coupled plasma atomic emission spectrometric method
  • GB/T 29558-2013 Surface chemical analysis.Auger electron spectroscopy.Repeatability and constancy of intensity scale
  • GB/T 28893-2012 Surface chemical analysis.Auger electron spectroscopy and X-ray photoelectron spectroscopy.Methods used to determine peak intensities and information required when reporting results
  • GB/T 29559-2013 Surface chemical analysis.Analysis of zinc and/or aluminium based metallic coatings by glow discharge optical emission spectrometry
  • GB/T 25188-2010 Thickness measurements for ultrathin silicon oxide layers on silicon wafers X-ray photoelectron spectroscopy
  • GB/T 28633-2012 Surface chemical analysis.X-ray photoelectron spectroscopy.Repeatability and constancy of intensity scale
  • GB/T 29731-2013 Surface chemical analysis.High-resolution Auger electron spectrometers.Calibration of energy scales for elemental and chemical-state analysis
  • GB/T 30702-2014 Surface chemical analysis.Auger electron spectroscopy and X-ray photoelectron spectroscopy.Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
  • GB/T 29732-2013 Surface chemical analysis.Medium resolution Auger electron spectrometers.Calibration of energy scales for elemental analysis
  • GB/T 25185-2010 Surface chemical analysis.X-ray photoelectron spectroscopy.Reporting of methods used for charge control and charge correction
  • GB/T 31227-2014 Test method for the surface roughness by atomic force microscope for sputtered thin films
  • GB/T 22462-2008 Nano,Sub-micron scale film on steel.Quantitative depth profile analysis.Glow discharge atomic emission spectrometry
  • GB/T 25186-2010 Surface chemical analysis.Secondary-ion mass spectrometry.Determination of relative sensitivity factors from ion-implanted reference materials
  • GB/T 32189-2015 Atomic Force Microscopy Examination of Surface Roughness of Gallium Nitride Single Crystal Substrate
  • GB/T 32495-2016 Surface chemical analysis.Secondary-ion mass spectrometry.Method for depth profiling of arsenic in silicon
  • GB/T 24575-2009 Test method for measuring surface sodium, aluminum, potassium, and iron on silicon and epi substrates by secondary ion mass spectrometry
  • GB/T 24582-2009 Test method for measuring surface metal contamination of polycrystalline silicon by acid extraction-inductively coupled plasma mass spectrometry
  • GB/T 24582-2023 Determination of metal impurity content on polysilicon surface by acid leaching-inductively coupled plasma mass spectrometry
  • GB/T 12128.2-1999 Reference sources for the calibration of surface contamination monitors Part 2: Electrons of energy less than 0.15MeV and photons of energy less than 1.5MeV
  • GB/T 4548.2-2003 Glassware-Hydrolytic resistance of the interior surfaces of glass containers-Determination by flame spectrometry and classification
  • GB/T 17830-1999 Determination of polyethylene glycol in polyethoxylated nonionic surfactants by HPLC
  • GB/T 5178-2008 Surface active agentsm-Determination of mean relative molecular mass for technical straight-chain sodium alkylbenzenesulfonates-- Gas-liquid chromatographic method
  • GB/T 29849-2013 Test method for measuring surface metallic contamination of silicon materials used for photovoltaic applications by inductively coupled plasma mass spectrometry
  • GB/T 22572-2008 A Method for Estimating Depth-Resolved Parameters Using Multi-delta Layered Reference Materials for Secondary Ion Mass Spectrometry in Surface Chemistry

International Organization for Standardization (ISO), Surface Atomic Energy Spectroscopy

  • ISO 19830:2015 Surface chemical analysis - Electron spectroscopies - Minimum reporting requirements for peak fitting in X-ray photoelectron spectroscopy
  • ISO 21270:2004 Surface chemical analysis - X-ray photoelectron and Auger electron spectrometers - Linearity of intensity scale
  • ISO 16129:2018 Surface chemical analysis — X-ray photoelectron spectroscopy — Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer
  • ISO 16129:2012 Surface chemical analysis - X-ray photoelectron spectroscopy - Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer
  • ISO 10810:2019 Surface chemical analysis — X-ray photoelectron spectroscopy — Guidelines for analysis
  • ISO/TR 18394:2016 Surface chemical analysis - Auger electron spectroscopy - Derivation of chemical information
  • ISO 10810:2010 Surface chemical analysis - X-ray photoelectron spectroscopy - Guidelines for analysis
  • ISO 15470:2017 Surface chemical analysis - X-ray photoelectron spectroscopy - Description of selected instrumental performance parameters
  • ISO 17109:2022 Surface chemical analysis — Depth profiling — Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth p
  • ISO/CD TR 18392:2023 Surface chemical analysis — X-ray photoelectron spectroscopy — Procedures for determining backgrounds
  • ISO 14237:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
  • ISO 14237:2000 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
  • ISO 14701:2018 Surface chemical analysis — X-ray photoelectron spectroscopy — Measurement of silicon oxide thickness
  • ISO 16242:2011 Surface chemical analysis - Recording and reporting data in Auger electron spectroscopy (AES)
  • ISO/DIS 17973:2023 Surface chemical analysis — Medium-resolution Auger electron spectrometers — Calibration of energy scales for elemental analysis
  • ISO 16531:2013 Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
  • ISO 14701:2011 Surface chemical analysis - X-ray photoelectron spectroscopy - Measurement of silicon oxide thickness
  • ISO 13424:2013 Surface chemical analysis — X-ray photoelectron spectroscopy — Reporting of results of thin-film analysis
  • ISO 16243:2011 Surface chemical analysis - Recording and reporting data in X-ray photoelectron spectroscopy (XPS)
  • ISO/CD 17973 Surface chemical analysis — Medium-resolution Auger electron spectrometers — Calibration of energy scales for elemental analysis
  • ISO 15471:2004 Surface chemical analysis - Auger electron spectroscopy - Description of selected instrumental performance parameters
  • ISO 15471:2016 Surface chemical analysis - Auger electron spectroscopy - Description of selected instrumental performance parameters
  • ISO 15472:2010 Surface chemical analysis - X-ray photoelectron spectrometers - Calibration of energy scales
  • ISO 15472:2001 Surface chemical analysis - X-ray photoelectron spectrometers - Calibration of energy scales
  • ISO 29081:2010 Surface chemical analysis - Auger electron spectroscopy - Reporting of methods used for charge control and charge correction
  • ISO/DIS 18118:2023 Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy — Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
  • ISO/FDIS 18118:2023 Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy — Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
  • ISO/TR 19319:2003 Surface chemical analysis - Auger electron spectroscopy and X-ray photoelectron spectroscopy - Determination of lateral resolution, analysis area, and sample area viewed by the analyser
  • ISO 13084:2018 Surface chemical analysis — Secondary ion mass spectrometry — Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
  • ISO 17109:2015 Surface chemical analysis - Depth profiling - Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
  • ISO 22048:2004 Surface chemical analysis — Information format for static secondary-ion mass spectrometry
  • ISO 22581:2021 Surface chemical analysis — Near real-time information from the X-ray photoelectron spectroscopy survey scan — Rules for identification of, and correction for, surface contamination by carbon-containi
  • ISO 18516:2006 Surface chemical analysis - Auger electron spectroscopy and X-ray photoelectron spectroscopy - Determination of lateral resolution
  • ISO/TS 22933:2022 Surface chemical analysis — Secondary ion mass spectrometry — Method for the measurement of mass resolution in SIMS
  • ISO 17973:2016 Surface chemical analysis - Medium-resolution Auger electron spectrometers - Calibration of energy scales for elemental analysis
  • ISO 17973:2002 Surface chemical analysis - Medium-resolution Auger electron spectrometers - Calibration of energy scales for elemental analysis
  • ISO 17293-2:2014 Surface active agents - Determination of chloroacetic acid (chloroacetate) in surfactants - Part 2: Ionic chromatographic method
  • ISO 20903:2019 Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy — Methods used to determine peak intensities and information required when reporting results
  • ISO/TR 18394:2006 Surface chemical analysis - Auger electron spectroscopy - Derivation of chemical information
  • ISO 7875-1:1984 Water quality; Determination of surfactants; Part 1 : Determination of anionic surfactants by the methylene blue spectrometric method
  • ISO/TR 18392:2005 Surface chemical analysis - X-ray photoelectron spectroscopy - Procedures for determining backgrounds
  • ISO/CD 5861 Surface chemical analysis — X-ray photoelectron spectroscopy — Method of intensity calibration for quartz-crystal monochromated Al Kα XPS instruments
  • ISO/DIS 5861:2023 Surface chemical analysis — X-ray photoelectron spectroscopy — Method of intensity calibration for quartz-crystal monochromated Al Kα XPS instruments
  • ISO 20411:2018 Surface chemical analysis - Secondary ion mass spectrometry - Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
  • ISO 13084:2011 Surface chemical analysis - Secondary-ion mass spectrometry - Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
  • ISO 19668:2017 Surface chemical analysis — X-ray photoelectron spectroscopy — Estimating and reporting detection limits for elements in homogeneous materials
  • ISO 16560:2015 Surface active agents - Determination of polyethylene glycol content in nonionic ethoxylated surfactants - HPLC method
  • ISO 23729:2022 Surface chemical analysis — Atomic force microscopy — Guideline for restoration procedure for atomic force microscopy images dilated by finite probe size
  • ISO 20903:2011 Surface chemical analysis - Auger electron spectroscopy and X-ray photoelectron spectroscopy - Methods used to determine peak intensities and information required when reporting results
  • ISO 18554:2016 Surface chemical analysis - Electron spectroscopies - Procedures for identifying, estimating and correcting for unintended degradation by X-rays in a material undergoing analysis by X-ray photoelectron spectroscopy
  • ISO 17974:2002 Surface chemical analysis - High-resolution Auger electron spectrometers - Calibration of energy scales for elemental and chemical-state analysis
  • ISO 24236:2005 Surface chemical analysis - Auger electron spectroscopy - Repeatability and constancy of intensity scale
  • ISO 12406:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of arsenic in silicon
  • ISO 2272:1989 Surface active agents; soaps; determination of low contents of free glycerol by molecular absorption spectrometry
  • ISO 17560:2014 Surface chemical analysis — Secondary-ion mass spectrometry — Method for depth profiling of boron in silicon
  • ISO 17925:2004 Zinc and/or aluminium based coatings on steel - Determination of coating mass per unit area and chemical composition - Gravimetry, inductively coupled plasma atomic emission spectrometry and flame atomic absorption spectrometry
  • ISO 18114:2003 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
  • ISO 18114:2021 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
  • ISO/TR 23173:2021 Surface chemical analysis - Electron spectroscopies - Measurement of the thickness and composition of nanoparticle coatings
  • ISO 17560:2002 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon
  • ISO 24237:2005 Surface chemical analysis - X-ray photoelectron spectroscopy - Repeatability and constancy of intensity scale
  • ISO 23830:2008 Surface chemical analysis - Secondary-ion mass spectrometry - Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
  • ISO 8769-2:1996 Reference sources for the calibration of surface contamination monitors - Part 2: Electrons of energy less than 0,15 MeV and photons of energy less than 1,5 MeV
  • ISO 15470:2004 Surface chemical analysis - X-ray photoelectron spectroscopy - Description of selected instrumental performance parameters
  • ISO 18118:2004 Surface chemical analysis - Auger electron spectroscopy and X-ray photoelectron spectroscopy - Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
  • ISO 18118:2015 Surface chemical analysis - Auger electron spectroscopy and X-ray photoelectron spectroscopy - Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
  • ISO 22415:2019 Surface chemical analysis — Secondary ion mass spectrometry — Method for determining yield volume in argon cluster sputter depth profiling of organic materials
  • ISO 178:1975 Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
  • ISO 17862:2013 Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
  • ISO 178:2019 Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
  • ISO 17862:2022 Surface chemical analysis — Secondary ion mass spectrometry — Linearity of intensity scale in single ion counting time-of-flight mass analysers
  • ISO 6841:1988 Surface active agents; technical straight-chain sodium alkylbenzenesulfonates; determination of mean relative molecular mass by gas-liquid chromatography
  • ISO 20341:2003 Surface chemical analysis - Secondary-ion mass spectrometry - Method for estimating depth resolution parameters with multiple delta-layer reference materials
  • ISO 6841:1983 Surface active agents — Technical straight-chain sodium alkylbenzenesulphonates — Determination of mean relative molecular mass — Gas-liquid chromatographic method
  • ISO/DIS 6980-2:2022 Nuclear energy — Reference beta-particle radiation — Part 2: Calibration fundamentals related to basic quantities characterizing the radiation field
  • ISO/FDIS 6980-2:2011 Nuclear energy — Reference beta-particle radiation — Part 2: Calibration fundamentals related to basic quantities characterizing the radiation field
  • ISO 23812:2009 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth calibration for silicon using multiple delta-layer reference materials

British Standards Institution (BSI), Surface Atomic Energy Spectroscopy

  • BS ISO 19830:2015 Surface chemical analysis. Electron spectroscopies. Minimum reporting requirements for peak fitting in X-ray photoelectron spectroscopy
  • BS ISO 21270:2004 Surface chemical analysis. X-ray photoelectron and Auger electron spectrometers. Linearity of intensity scale
  • BS ISO 16129:2012 Surface chemical analysis. X-ray photoelectron spectroscopy. Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer
  • BS ISO 16129:2018 Tracked Changes. Surface chemical analysis. X-ray photoelectron spectroscopy. Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer
  • BS ISO 10810:2010 Surface chemical analysis. X-ray photoelectron spectroscopy. Guidelines for analysis
  • PD ISO/TR 18394:2016 Surface chemical analysis. Auger electron spectroscopy. Derivation of chemical information
  • PD ISO/TR 23173:2021 Surface chemical analysis. Electron spectroscopies. Measurement of the thickness and composition of nanoparticle coatings
  • BS ISO 14237:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
  • BS ISO 16242:2011 Surface chemical analysis. Recording and reporting data in Auger electron spectroscopy (AES)
  • BS ISO 10810:2019 Tracked Changes. Surface chemical analysis. X-ray photoelectron spectroscopy. Guidelines for analysis
  • BS ISO 14701:2011 Surface chemical analysis. X-ray photoelectron spectroscopy. Measurement of silicon oxide thickness
  • BS ISO 15471:2016 Tracked Changes. Surface chemical analysis. Auger electron spectroscopy. Description of selected instrumental performance parameters
  • BS ISO 16531:2013 Surface chemical analysis. Depth profiling. Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
  • BS ISO 16243:2011 Surface chemical analysis. Recording and reporting data in X-ray photoelectron spectroscopy (XPS)
  • BS ISO 15471:2005 Surface chemical analysis - Auger electron spectroscopy - Description of selected instrumental performance parameters
  • BS ISO 29081:2010 Surface chemical analysis - Auger electron spectroscopy - Reporting of methods used for charge control and charge correction
  • BS ISO 14701:2018 Tracked Changes. Surface chemical analysis. X-ray photoelectron spectroscopy. Measurement of silicon oxide thickness
  • BS EN 13273:2001 Surface active agents - Determination of the content of non-ionic substances in anionic surface active agents by high performance liquid chromatography (HPLC)
  • BS ISO 17109:2015 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
  • BS ISO 17109:2022 Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin…
  • 21/30433862 DC BS ISO 17109 AMD1. Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and…
  • 23/30461294 DC BS ISO 18118. Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
  • BS ISO 17973:2016 Tracked Changes. Surface chemical analysis. Medium-resolution Auger electron spectrometers. Calibration of energy scales for elemental analysis
  • BS ISO 20903:2019 Tracked Changes. Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Methods used to determine peak intensities and information required when reporting results
  • BS ISO 24465:2023 Surface chemical analysis. Determination of the minimum detectability of surface plasmon resonance device
  • BS ISO 17293-2:2014 Surface active agents. Determination of chloroacetic acid (chloroacetate) in surfactants. Ionic chromatographic method
  • BS ISO 18516:2006 Surface chemical analysis - Auger electron spectroscopy and X-ray photoelectron spectroscopy - Determination of lateral resolution
  • BS ISO 13084:2011 Surface chemical analysis. Secondary-ion mass spectrometry. Calibration of the mass scale for a time-of-flight secondary-ion mass spectrometer
  • BS ISO 22048:2004 Surface chemical analysis. Information format for static secondary-ion mass spectrometry
  • BS ISO 18118:2015 Tracked Changes. Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
  • BS ISO 17973:2003 Surface chemical analysis - Medium-resolution Auger electron spectrometers - Calibration of energy scales for elemental analysis
  • BS ISO 20411:2018 Surface chemical analysis. Secondary ion mass spectrometry. Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
  • BS ISO 22581:2021 Surface chemical analysis. Near real-time information from the X-ray photoelectron spectroscopy survey scan. Rules for identification of, and correction for, surface contamination by carbon-containing compounds
  • BS PD ISO/TR 18394:2016 Surface chemical analysis. Auger electron spectroscopy. Derivation of chemical information
  • BS ISO 22048:2005 Surface chemical analysis - Information format for static secondary-ion mass spectrometry
  • BS ISO 19668:2017 Surface chemical analysis. X-ray photoelectron spectroscopy. Estimating and reporting detection limits for elements in homogeneous materials
  • 21/30404376 DC BS ISO 24465. Surface chemical analysis. Determination of the minimum detectability of Surface Plasmon Resonance device
  • BS ISO 20903:2011 Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Methods used to determine peak intensities and information required when reporting results
  • BS ISO 21270:2005 Surface chemical analysis - X-ray photoelectron and Auger electron spectrometers - Linearity of intensity scale
  • BS ISO 23729:2022 Surface chemical analysis. Atomic force microscopy. Guideline for restoration procedure for atomic force microscopy images dilated by finite probe size
  • 20/30423741 DC BS ISO 19318. Surface chemical analysis. X-ray photoelectron spectroscopy. Reporting of methods used for charge control and charge correction
  • BS ISO 18114:2003 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
  • BS ISO 18554:2016 Surface chemical analysis. Electron spectroscopies. Procedures for identifying, estimating and correcting for unintended degradation by X-rays in a material undergoing analysis by X-ray photoelectron spectroscopy
  • BS ISO 13084:2018 Tracked Changes. Surface chemical analysis. Secondary ion mass spectrometry. Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
  • BS ISO 17974:2002 Surface chemical analysis - High-resolution Auger electron spectrometers - Calibration of energy scales for elemental and chemical-state analysis
  • BS ISO 19318:2021 Tracked Changes. Surface chemical analysis. X-ray photoelectron spectroscopy. Reporting of methods used for charge control and charge correction
  • BS ISO 12406:2010 Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of arsenic in silicon
  • 21/30412880 DC BS ISO 23729. Surface chemical analysis. Atomic force microscopy. Guideline for restoration procedure for atomic force microscopy images dilated by finite probe size
  • 20/30409889 DC BS ISO 18114. Surface chemical analysis. Secondary-ion mass spectrometry. Determination of relative sensitivity factors from ion-implanted reference materials
  • BS PD ISO/TR 23173:2021 Surface chemical analysis. Electron spectroscopies. Measurement of the thickness and composition of nanoparticle coatings
  • BS ISO 24236:2005 Surface chemical analysis - Auger electron spectroscopy - Repeatability and constancy of intensity scale
  • BS ISO 23830:2008 Surface chemical analysis - Secondary-ion mass spectrometry - Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
  • BS ISO 18114:2021 Tracked Changes. Surface chemical analysis. Secondary-ion mass spectrometry. Determination of relative sensitivity factors from ion-implanted reference materials
  • 19/30364173 DC BS ISO 22581. Surface chemical analysis by XPS. Data management and treatment. Near real time information from the X-ray photoelectron spectroscopy survey scan. Rules for identification of, and correction for, the presence of surface contamination by c...
  • BS ISO 17560:2002 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon
  • BS ISO 17560:2014 Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of boron in silicon
  • BS ISO 15472:2010 Surface chemical analysis - X-ray photoelectron spectrometers - Calibration of energy scales
  • BS ISO 24237:2005 Surface chemical analysis - X-ray photoelectron spectroscopy - Repeatability and constancy of intensity scale
  • BS ISO 17862:2013 Surface chemical analysis. Secondary ion mass spectrometry. Linearity of intensity scale in single ion counting time-of-flight mass analysers
  • BS ISO 15470:2005 Surface chemical analysis - X-ray photoelectron spectroscopy - Description of selected instrumental performance parameters
  • BS ISO 15470:2017 Surface chemical analysis. X-ray photoelectron spectroscopy. Description of selected instrumental performance parameters
  • BS 6829-3.1:1989 Analysis of surface active agents (raw materials). Sodium alkylbenzenesulphonates. Method for determination of mean relative molecular mass
  • BS ISO 17862:2022 Surface chemical analysis. Secondary ion mass spectrometry. Linearity of intensity scale in single ion counting time-of-flight mass analysers
  • BS EN IEC 60904-3:2019 Photovoltaic devices - Measurement principles for terrestrial photovoltaic (PV) solar devices with reference spectral irradiance data
  • BS EN IEC 61010-2-061:2021 Tracked Changes. Safety requirements for electrical equipment for measurement, control and laboratory use. Particular requirements for laboratory atomic spectrometers with thermal atomization and ionization
  • BS ISO 20341:2003 Surface chemical analysis - Secondary-ion mass spectrometry - Method for estimating depth resolution parameters with multiple delta-layer reference materials
  • BS ISO 18118:2005 Surface chemical analysis - Auger electron spectroscopy and X-ray photoelectron spectroscopy - Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials

German Institute for Standardization, Surface Atomic Energy Spectroscopy

  • DIN ISO 16129:2020-11 Surface chemical analysis - X-ray photoelectron spectroscopy - Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer (ISO 16129:2018); Text in English
  • DIN ISO 15472:2020-05 Surface chemical analysis - X-ray photoelectron spectrometers - Calibration of energy scales (ISO 15472:2010); Text in English
  • DIN ISO 16129:2020 Surface chemical analysis - X-ray photoelectron spectroscopy - Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer (ISO 16129:2018); Text in English
  • DIN ISO 16242:2020-05 Surface chemical analysis - Recording and reporting data in Auger electron spectroscopy (AES) (ISO 16242:2011); Text in English
  • DIN ISO 15472:2020 Surface chemical analysis - X-ray photoelectron spectrometers - Calibration of energy scales (ISO 15472:2010); Text in English
  • DIN EN 13273:2001 Surface active agents - Determination of the contents of non-ionic substances in anionic surface active agents by high performance liquid chromatograph (HPLC); German version EN 13273:2001
  • DIN EN 13273:2001-06 Surface active agents - Determination of the contents of non-ionic substances in anionic surface active agents by high performance liquid chromatograph (HPLC); German version EN 13273:2001
  • DIN ISO 13472-1:2023-02 Acoustics - Measurement of sound absorption properties of road surfaces in situ - Part 1: Extended surface method (ISO 13472-1:2022); Text in German and English / Note: Date of issue 2023-01-06*Intended as replacement for DIN ISO 13472-1 (2004-04).
  • DIN ISO 16242:2020 Surface chemical analysis - Recording and reporting data in Auger electron spectroscopy (AES) (ISO 16242:2011); Text in English
  • DIN 50990:1993 Measurement of coating thickness; determination of the mass per unit area of metallic coatings by atomic absorption spectrometric method; flame method, F AAS
  • DIN EN 61010-2-061:2004 Safety requirements for electrical equipment for measurement, control and laboratory use - Part 2-061: Particular requirements for laboratory atomic spectrometers with thermal atomization and ionization (IEC 61010-2-061:2003); German version EN 61010-2-06
  • DIN ISO 1776:1988 Glass; resistance to attack by hydrochloric acid at 100 °C; flame emission or flame atomic absorption spectrometric method; identical with ISO 1776, edition 1985

Korean Agency for Technology and Standards (KATS), Surface Atomic Energy Spectroscopy

  • KS D ISO 21270:2005 Surface chemical analysis-X-ray photoelectron and Auger electron spectrometers-Linearity of intensity scale
  • KS D ISO 21270-2005(2020) Surface chemical analysis-X-ray photoelectron and Auger electron spectrometers-Linearity of intensity scale
  • KS D ISO 19319-2005(2020) Surface chemical analysis-Auger electron spectroscopy and X-ray photoelectron spectroscopy-Determination of lateral resolution, analysis area, and sample area viewed by the analyzer
  • KS D ISO 15470-2005(2020) Surface chemical analysis-X-ray photoelectron spectroscopy-Description of selected instrumental performance parameters
  • KS D ISO 15471-2005(2020) Surface chemical analysis-Auger electron spectroscopy-Description of selected instrumental performance parameters
  • KS D ISO 17973-2011(2016) Surface chemical analysis-Medium-resolution Auger electron spectrometers-Calibration of energy scales for elemental analysis
  • KS D ISO 14237:2003 Surface chemical analysis-Secondary-ion mass spectrometry-Determination of boron atomic concentration in silicon using uniformly doped materials
  • KS D ISO 15471:2005 Surface chemical analysis-Auger electron spectroscopy-Description of selected instrumental performance parameters
  • KS D ISO 18118-2005(2020) Surface chemical analysis-Auger electron spectroscopy and X-ray photoelectron spectroscopy-Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of h
  • KS D ISO 19319:2005 Surface chemical analysis-Auger electron spectroscopy and X-ray photoelectron spectroscopy-Determination of lateral resolution, analysis area, and sample area viewed by the analyzer
  • KS D ISO 17973-2011(2021) Surface chemical analysis-Medium-resolution Auger electron spectrometers-Calibration of energy scales for elemental analysis
  • KS D ISO 19318-2005(2020) Surface chemical analysis-X-ray photoelectron spectroscopy-Reporting of methods used for charge control and charge correction
  • KS D ISO 17974-2011(2016) Surface chemical analysis-High-resolution Auger electron spectrometers-Calibration of energy scales for elemental and chemical-state analysis
  • KS D ISO 22048-2005(2020) Surface chemical analysis - Information format for static secondary-ion mass spectrometry
  • KS D ISO 17973:2011 Surface chemical analysis-Medium-resolution Auger electron spectrometers-Calibration of energy scales for elemental analysis
  • KS D ISO 22048:2005 Surface chemical analysis - Information format for static secondary-ion mass spectrometry
  • KS D ISO 17974-2011(2021) Surface chemical analysis-High-resolution Auger electron spectrometers-Calibration of energy scales for elemental and chemical-state analysis
  • KS D ISO 15472:2003 Surface chemical analysis-X-ray photoelectron spectrometers-Calibration of energy scales
  • KS D ISO 17925-2006(2016) Zinc and/or aluminium based coatings on steel-Determination of coating mass per unit area and chemical composition-Gravimetry, inductively coupled plasma atomic emission spectrometry and flame atomic
  • KS D ISO 18114-2005(2020) Surface chemical analysis-Secondary-ion mass spectrometry-Determination of relative sensitivity factors from ion-implanted reference materials
  • KS M ISO 2272-2007(2022) Surface active agents-Soaps-Determination of low contents of free glycerol by molecular absorption spectrometry
  • KS M ISO 2272-2007(2017) Surface active agents-Soaps-Determination of low contents of free glycerol by molecular absorption spectrometry
  • KS D ISO 17974:2011 Surface chemical analysis-High-resolution Auger electron spectrometers-Calibration of energy scales for elemental and chemical-state analysis
  • KS D ISO 17925:2006 Zinc and/or aluminium based coatings on steel-Determination of coating mass per unit area and chemical composition-Gravimetry, inductively coupled plasma atomic emission spectrometry and flame atomic absorption spectrometry
  • KS D ISO 17925:2021 Zinc and/or aluminium based coatings on steel — Determination of coating mass per unit area and chemical composition — Gravimetry,inductively coupled plasma atomic emission spectrometry and flame atom
  • KS D ISO 18114:2005 Surface chemical analysis-Secondary-ion mass spectrometry-Determination of relative sensitivity factors from ion-implanted reference materials
  • KS D ISO 14237-2003(2018)
  • KS D ISO 15472-2003(2018)
  • KS D ISO 17560:2003 Surface chemical analysis-Secondary-on mass spectrometry- Method for depth profiling of boron in silicon
  • KS A ISO 8769-2:2003 Reference sources for the calibration of surface contamination monitors-Part 2:Electrons of energy less than 0.15 MeV and photons of energy less than 1.5 MeV
  • KS D ISO 15470:2005 Surface chemical analysis-X-ray photoelectron spectroscopy-Description of selected instrumental performance parameters
  • KS D ISO 18118:2005 Surface chemical analysis-Auger electron spectroscopy and X-ray photoelectron spectroscopy-Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
  • KS M ISO 2272:2007 Surface active agents-Soaps-Determination of low contents of free glycerol by molecular absorption spectrometry
  • KS A ISO 8769-2-2003(2018)
  • KS M ISO 6841-2007(2018) Surface active agents-Technical straight-chain sodium alkylbenzenesulfonates-Determination of mean relative molecular mass by gas-liquid chromatography
  • KS A ISO 7503-3:2003 Evaluation of surface contamination-Part 3:Isomeric transition and electron capture emitters, low energy beta-emitters(E βmax < 0.15 MeV)
  • KS M ISO 6841:2007 Surface N agents-Technical straight-chain sodium alkylbenzenesulfonates-Determination of mean relative molecular mass by gas-liquid chromatography
  • KS D ISO 20341:2005 Surface chemical analysis-Secondary-ion mass spectrometry-Method for estimating depth resolution parameters with multiple delta-layer reference materials
  • KS D ISO 20341-2005(2020) Surface chemical analysis-Secondary-ion mass spectrometry-Method for estimating depth resolution parameters with multiple delta-layer reference materials

未注明发布机构, Surface Atomic Energy Spectroscopy

  • BS ISO 18516:2006(2010) Surface chemical analysis — Auger electron spectroscopy and X - ray photoelectron spectroscopy — Determination of lateral resolution
  • BS ISO 21270:2004(2010) Surface chemical analysis — X - ray photoelectron and Auger electron spectrometers — Linearity of intensity scale
  • BS ISO 17974:2002(2010) Surface chemical analysis — High - resolution Auger electron spectrometers — Calibration of energy scales for elemental and chemical - state analysis
  • BS ISO 22048:2004(2005) Surface chemical analysis — Information format for static secondary - ion mass spectrometry
  • ISO 7530-1:1990/Cor 1:1992 Nickel alloys — Flame atomic absorption spectrometric analysis — Part 1: General requirements and sample dissolution
  • BS ISO 20341:2003(2010) Surface chemical analysis — Secondary - ion mass spectrometry — Method for estimating depth resolution parameters with multiple delta - layer reference materials

中华人民共和国国家质量监督检验检疫总局、中国国家标准化管理委员会, Surface Atomic Energy Spectroscopy

  • GB/T 22571-2017 Surface chemical analysis—X-ray photoelectron spectrometers—Calibration of energy scales
  • GB/T 32565-2016 Surface chemical analysis—Recording and reporting data in Auger electron spectroscopy (AES)
  • GB/T 33502-2017 Surface chemical analysis—Recording and reporting data in X-ray photoelectron spectroscopy(XPS)
  • GB/T 32998-2016 Surface chemical analysis—Auger electron spectroscopy—Reporting of methods used for charge control and charge correction
  • GB/T 17830-2017 Determination of polyethylene glycol content in nonionic ethoxylated surfactants—HPLC method

Association Francaise de Normalisation, Surface Atomic Energy Spectroscopy

  • NF ISO 24236:2006 Analyse chimique des surfaces - Spectroscopie des électrons Auger - Répétabilité et constance de l'échelle d'énergie
  • NF X21-071:2011 Surface Chemical Analysis - X-ray photoelectron Spectroscopy - Guidelines for analysis.
  • NF ISO 16242:2012 Analyse chimique des surfaces - Enregistrement et notification des données en spectroscopie des électrons Auger (AES)
  • NF X21-070*NF ISO 14237:2010 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials.
  • NF X21-072*NF ISO 16242:2012 Surface chemical analysis - Recording and reporting data in Auger electron spectroscopy (AES).
  • NF ISO 14237:2010 Analyse chimique des surfaces - Spectrométrie de masse des ions secondaires - Dosage des atomes de bore dans le silicium à l'aide de matériaux dopés uniformément
  • NF X21-073*NF ISO 16243:2012 Surface chemical analysis - Recording and reporting data in X-ray photoelectron spectroscopy (XPS).
  • NF ISO 16243:2012 Analyse chimique des surfaces - Enregistrement et notification des données en spectroscopie de photoélectrons par rayons X (XPS)
  • NF ISO 17973:2006 Analyse chimique des surfaces - Spectromètres d'électrons Auger à résolution moyenne - Étalonnage des échelles d'énergie pour l'analyse élémentaire
  • NF X21-055:2006 Surface chemical analysis - X-ray photoelectron spectrometers - Calibration of energy scales.
  • NF EN 13273:2001 Agents de surface - Détermination de la teneur en substances non-ioniques dans les agents de surface anioniques par chromatographie liquide à haute performance (CLHP)
  • NF T73-263*NF EN 13273:2001 Surface active agents - Determination of the contents of non-ionic susbstances in anionic surface active agents by high performance liquid chromatography (HPLC).
  • NF ISO 29081:2010 Analyse chimique des surfaces - Spectroscopie d'électrons Auger - Indication des méthodes mises en oeuvre pour le contrôle et la correction de la charge
  • NF ISO 13472-1:2022 Acoustique - Mesurage in situ des propriétés d'absorption acoustique des revêtements de chaussées - Partie 1 : méthode de la surface étendue
  • NF X21-061:2008 Surface chemical analysis - Auger electron spectroscopy and X-ray photoelectron spectroscopy - Determination of lateral resolution.
  • NF X21-054*NF ISO 17973:2006 Surface chemical analysis - Medium-resolution Auger electron spectrometers - Calibration of energy scales for elemental analysis.
  • NF ISO 17974:2009 Analyse chimique des surfaces - Spectromètres d'électrons Auger à haute résolution - Étalonnage des échelles d'énergie pour l'analyse élémentaire et de l'état chimique
  • NF X21-058:2006 Surface chemical analysis - Auger electron spectroscopy and X-ray photoelectron spectroscopy - Methods used to determine peak intensities and information required when reporting results.
  • NF ISO 23830:2009 Analyse chimique des surfaces - Spectrométrie de masse des ions secondaires - Répétabilité et constance de l'échelle des intensités relatives en spectrométrie statique de masse des ions secondaires
  • NF M64-100:1992 Mechanical equipment of nuclear reactors : design and construction rules. Hard facing by cobalt alloys melting for mechanical equipment of nuclear reactors.
  • NF ISO 2272:1989 Agents de surface - Savons - Dosage du glycérol libre en faibles teneurs par spectrométrie d'absorption moléculaire
  • NF X21-059*NF ISO 24236:2006 Surface chemical analysis - Auger electron spectroscopy - Repeatability and constancy of intensity scale.
  • NF T60-311*NF ISO 2272:1989 Surface active agents. Soaps. Determination of low contents of free glycerol by molecular absorption spectrometry.
  • NF X21-068*NF ISO 29081:2010 Surface chemical analysis - Auger electron spectroscopy - Reporting of methods used for charge control and charge correction
  • NF X21-051*NF ISO 17560:2006 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon
  • NF X21-064*NF ISO 23830:2009 Surface chemical analysis - Secondary-ion mass spectrometry - Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry.
  • NF ISO 17560:2006 Analyse chimique des surfaces - Spectrométrie de masse des ions secondaires - Dosage du bore dans le silicium par profilage d'épaisseur
  • NF T73-239*NF ISO 6841:1988 Surface active agents. Technical straight-chain sodium alkylbenzenesulfonates. Determination of mean relative molecular mass by gas-liquid chromatography.
  • NF T70-357:2007 Energetic materials for defence - Physico-chemical analysis and properties - Determination of metallic elements by atomic absorption spectrophotometry
  • NF ISO 16796:2022 Énergie nucléaire - Dosage de Gd2O3 dans des mélanges de poudres et dans des pastilles combustibles au gadolinium par spectrométrie par émission atomique à plasma à couplage inductif (ICP-AES)
  • NF X21-004*NF ISO 22309:2012 Microbeam analysis - Quantitative analysis using energy-dispersive spectrometry (EDS) for elements with an atomic number of 11 (Na) or above.
  • NF ISO 23812:2009 Analyse chimique des surfaces - Spectrométrie de masse des ions secondaires - Méthode pour l'étalonnage de la profondeur pour le silicium à l'aide de matériaux de référence à couches delta multiples
  • NF T73-279*NF EN 13405:2003 Surface active agents - Determination of dialkyl-tetralins content in linear alkylbenzene by high performance liquid chromatography (HPLC).
  • NF M60-805-2:2003 Nuclear energy - Measurement of radioactivity in the environment - Water - Part 2 : measurement of the concentration of uranium in water by inductively coupled plasma atomic emission spectroscopy.
  • NF ISO 6841:1988 Agents de surface - Alkylbenzène sulfonates de sodium linéaires techniques - Détermination de la masse moléculaire relative moyenne par chromatographie gaz-liquide.

KR-KS, Surface Atomic Energy Spectroscopy

Japanese Industrial Standards Committee (JISC), Surface Atomic Energy Spectroscopy

  • JIS K 0143:2023 Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials
  • JIS K 0143:2000 Surface chemical analysis -- Secondary ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials
  • JIS K 0161:2010 Surface chemical analysis -- Auger electron spectroscopy -- Description of selected instrumental performance parameters
  • JIS K 0152:2014 Surface chemical analysis.X-ray photoelectron spectroscopy.Repeatability and constancy of intensity scale
  • JIS K 0165:2011 Surface chemical analysis -- Medium-resolution Auger electron spectrometers -- Calibration of energy scales for elemental analysis
  • JIS K 0167:2011 Surface chemical analysis -- Auger electron spectroscopy and X-ray photoelectron spectroscopy -- Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
  • JIS K 0400-30-10:1999 Water quality -- Determination of surfactants -- Part 1: Determination of anionic surfactants by the methylene blue spectrometric method
  • JIS K 0168:2011 Surface chemical analysis -- Information format for static secondary-ion mass spectrometry
  • JIS K 0157:2021 Surface chemical analysis -- Secondary ion mass spectrometry -- Calibration of the mass scale for a time-of-flight secondary ion mass spectrometer
  • JIS K 0164:2023 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon
  • JIS K 0158:2021 Surface chemical analysis -- Secondary ion mass spectrometry -- Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry
  • JIS K 0166:2011 Surface chemical analysis -- High-resolution Auger electron spectrometers -- Calibration of energy scales for elemental and chemical-state analysis
  • JIS K 0153:2015 Surface chemical analysis -- Secondary-ion mass spectrometry -- Repeatability and constancy of the relative-intensity scale in static secondary-ion mass spectrometry
  • JIS K 0163:2010 Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of relative sensitivity factors from ion-implanted reference materials
  • JIS R 1683:2007 Test method for surface roughness of ceramic thin films by atomic force microscopy
  • JIS R 1683:2014 Test method for surface roughness of ceramic thin films by atomic force microscopy
  • JIS K 0145:2002 Surface chemical analysis -- X-ray photoelectron spectrometers -- Calibration of energy scales
  • JIS K 0164:2010 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth profiling of boron in silicon
  • JIS K 0162:2010 Surface chemical analysis -- X-ray photoelectron spectroscopy -- Description of selected instrumental performance parameters
  • JIS K 0155:2018 Surface chemical analysis -- Secondary ion mass spectrometry -- Linearity of intensity scale in single ion counting time-flight mass analysers
  • JIS K 0156:2018 Surface chemical analysis -- Secondary-ion mass spectrometry -- Method for depth calibration for silicon using multiple delta-layer reference materials

RU-GOST R, Surface Atomic Energy Spectroscopy

  • GOST R ISO 17925-2012 Zinc and/or aluminium based coatings on steel. Determination of chemical composition and coating mass per unit area. Gravimetry, atomic emission spectrometry with inductively coupled plasma and flame atomic absorption spectrometry methods
  • GOST 29075-1991 Nuclear instrumentation systems for nuclear power stations. General requirements
  • GOST R ISO 16962-2012 Zinc and/or aluminium based coatings on steel. Determination of coating thickness, chemical composition and mass per unit area byglow discharge atomic emission spectrometry method
  • GOST R ISO 16242-2016 State system for insuring the uniformity of measurements. Surface chemical analysis. Recording and reporting data in Auger electron spectroscopy (AES)
  • GOST R ISO 16243-2016 State system for insuring the uniformity of measurements Surface chemical analysis. Recording and reporting data in X-ray photoelectron spectroscopy (XPS)
  • GOST 25804.1-1983 Atomic power station technological processes control system equipment. General
  • GOST 25804.2-1983 Atomic power station technological processes control system equipment. Reliability requirements

Standard Association of Australia (SAA), Surface Atomic Energy Spectroscopy

  • AS ISO 15472:2006 Surface chemical analysis - X-ray photoelectron spectrometers - Calibration of energy scales
  • AS 3506:1987 Waters - Determination of filtrable synthetic anionic surfactants - Copper-ethylenediamine flame atomic absorption spectrometric method
  • AS 2134.1:1999 Recommended practice for chemical analysis by atomic absorption spectrometry - Flame atomic absorption spectrometry
  • AS ISO 14237:2006 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials
  • AS ISO 15470:2006 Surface chemical analysis - X-ray photoelectron spectroscopy - Description of selected instrumental performance parameters
  • AS ISO 19319:2006 Surface chemical analysis - Augur electron spectroscopy and X-ray photoelectron spectroscopy - Determination of lateral resolution, analysis area and sample area viewed by the analyser
  • AS ISO 18118:2006 Surface chemical analysis - Auger electron spectroscopy and X-ray photoelectron spectroscopy - Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
  • AS ISO 22048:2006 Surface chemical analysis - Information format for static secondary-ion mass spectrometry
  • AS/NZS 2891.14.4:1999 Methods of sampling and testing asphalt - Field density tests - Calibration of nuclear surface moisture-density gauge - Backscatter mode
  • AS ISO 18114:2006 Surface chemical analysis - Secondary-ion mass spectrometry - Determination of relative sensitivity factors from ion-implanted reference materials
  • AS ISO 24237:2006 Surface chemical analysis - X-ray photoelectron spectroscopy - Repeatability and constancy of intensity scale
  • AS ISO 17560:2006 Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon
  • AS ISO 19318:2006 Surface chemical analysis - X-ray photoelectron spectroscopy - Reporting of methods used for charge control and charge correction

Group Standards of the People's Republic of China, Surface Atomic Energy Spectroscopy

  • T/CSTM 00964-2022 General rules for performance evaluation of atomic spectrometer
  • T/CAIA YQ004-2018 Performance testing method for liquid chromatograph coupled with atomic fluorescence spectrometer
  • T/CSTM 00962-2022 Evaluation method for spectrometer performance of spark discharge atomic emission
  • T/GAIA 017-2022 Determination of fluorine content in the surface coating of aluminum and aluminum alloys— Scanning electron microscope and energy dispersive spectrometer method
  • T/CEC 474-2021 Guidelines for Electrochemical Impedance Spectroscopy Test of Anticorrosion Properties of Surface Materials of Metal Components in Seawater Pumped Storage Power Stations
  • T/CASAS 032-2023 Test method for the content of metal elements on the surface of silicon carbide wafer—Inductively coupled plasma mass spectrometry

American Society for Testing and Materials (ASTM), Surface Atomic Energy Spectroscopy

  • ASTM F3400-19 Standard Test Method for In-situ Testing of Functional Properties of Equine Surfaces: Artificial Surfaces
  • ASTM F1724-96 Standard Test Method for Measuring Surface Metal Contamination of Polycrystalline Silicon by Acid Extraction-Atomic Absorption Spectroscopy
  • ASTM E2994-21 Standard Test Method for Analysis of Titanium and Titanium Alloys by Spark Atomic Emission Spectrometry and Glow Discharge Atomic Emission Spectrometry (Performance-Based Method)
  • ASTM F2569-07 Standard Test Method for Evaluating the Force Reduction Properties of Surfaces for Athletic Use
  • ASTM F2569-11 Standard Test Method for Evaluating the Force Reduction Properties of Surfaces for Athletic Use
  • ASTM E2994-16 Standard Test Method for Analysis of Titanium and Titanium Alloys by Spark Atomic Emission Spectrometry and Glow Discharge Atomic Emission Spectrometry (Performance-Based Method)
  • ASTM E722-14 Standard Practice for Characterizing Neutron Fluence Spectra in Terms of an Equivalent Monoenergetic Neutron Fluence for Radiation-Hardness Testing of Electronics
  • ASTM E722-19 Standard Practice for Characterizing Neutron Fluence Spectra in Terms of an Equivalent Monoenergetic Neutron Fluence for Radiation-Hardness Testing of Electronics
  • ASTM E2594-20 Standard Test Method for Analysis of Nickel Alloys by Inductively Coupled Plasma Atomic Emission Spectrometry (Performance-Based)
  • ASTM E2594-09(2014) Standard Test Method for Analysis of Nickel Alloys by Inductively Coupled Plasma Atomic Emission Spectrometry 40;Performance-Based Method41;
  • ASTM D8280-20 Standard Test Method for Determination of the Blooming of Brominated Flame Retardants onto the Surface of Plastic Materials by Ion Chromatography
  • ASTM D8280-20a Standard Test Method for Determination of the Blooming of Brominated Flame Retardants onto the Surface of Plastic Materials by Ion Chromatography
  • ASTM E3061-17 Standard Test Method for Analysis of Aluminum and Aluminum Alloys by Inductively Coupled Plasma Atomic Emission Spectrometry (Performance Based Method)
  • ASTM E2594-09 Standard Test Method for Analysis of Nickel Alloys by Inductively Coupled Plasma Atomic Emission Spectrometry (Performance-Based Method)
  • ASTM E3084-17 Standard Practice for Characterizing Particle Irradiations of Materials in Terms of Non-Ionizing Energy Loss (NIEL)
  • ASTM E1729-99 Standard Practice for Field Collection of Dried Paint Samples for Lead Determination by Atomic Spectrometry Techniques
  • ASTM F1617-98 Standard Test Method for Measuring Surface Sodium, Aluminum, Potassium, and Iron on Silicon and EPI Substrates by Secondary Ion Mass Spectrometry
  • ASTM E607-90(1996) Standard Test Method for Optical Emission Spectrometric Analysis of Aluminum and Aluminum Alloys by the Point-to-Plane Technique, Nitrogen Atmosphere
  • ASTM E607-02 Standard Test Method for Atomic Emission Spectrometric Analysis Aluminum Alloys by the Point to Plane Technique Nitrogen Atmosphere
  • ASTM E2371-13 Standard Test Method for Analysis of Titanium and Titanium Alloys by Direct Current Plasma and Inductively Coupled Plasma Atomic Emission Spectrometry (Performance-Based Test Methodology)

AENOR, Surface Atomic Energy Spectroscopy

  • UNE 55614:1984 SURFACE ACTIVE AGENTS. SODIUM HYDROXIDE TO BE USED AS RAW-MATERIAL IN DETERGENT FORMULATIONS. DETERMINATION OF MERCURY CONTENT. FLAMELESS ATOMIC ABSORPTION SPECTROMETRIC METHOD
  • UNE 55752:1984 SURFACE ACTIVE AGENTS. CONDENSED PHOSPHATES TO BE USED AS RAW-MATERIALS IN DETERGENT FORMULATIONS. DETERMINATION OF CALCIUM CONTENT. FLAME ATOMIC ABSORPTION SPECTROMETRIC METHOD
  • UNE 84030:2003 Cosmetic raw materials. Determination of the chloride ions content of surface active agents for cosmetic use.
  • UNE 84028:2003 Cosmetic raw materials. Determination of formaldehyde in anionic surfactants for cosmetic use.
  • UNE 55844:1991 SURFACE ACTIVE AGENTS. DETERMINATION OF BIODEGRADABILITY OF NON-IONIC SURFACTANTS USED IN DETERGENT FABRICATION.
  • UNE 55523:1990 SURFACE ACTIVE AGENTS. DETERMINATION OF THE BIODEGRADABILITY OF ANIONIC SURFACTANTS USED IN DETERGENT FABRICATION
  • UNE 55905:1991 SURFACE ACTIVE AGENTS. SOAPS. DETERMINATION OF LOW CONTENTS OF FREE GLYCEROL BY MOLECULAR ABSORPTION SPECTROMETRY.
  • UNE 11020-1:1992 CHAIRS AND STOOLS FOR PUBLIC AND DOMESTIC USE. SPECIFICATION FOR PERFORMANCE REQUIREMENTS. PART 1: MATERIALS AND SUPERFICIAL FINISHES.
  • UNE 55806:1990 SURFACE ACTIVE AGENTS. TECHNICAL STRAIGHT-CHAIN SODIUM ALKYLBENZENESULFONATES. DETERMINATION OF MEAN RELATIVE MOLECULAR MASS BY GAS-LIQUID CHROMATOGRAPHY
  • UNE 55803:1986 SURFACE ACTIVE AGENTS. CHEMICAL PRODUCTS TO BE USED AS RAW MATERIALS IN DETERGENT FORMULATIONS. GENERAL METHODS FOR DETERMINATION OF CHLORIDE IONS. POTENTIOMETRIC METHOD
  • UNE 11022-1:1992 TABLES FOR PUBLIC AND DOMESTIC USE. SPECIFICATION FOR PERFORMANCE REQUIREMENTS. PART 1: MATERIALS AND SUPERFICIAL FINISHES.

Danish Standards Foundation, Surface Atomic Energy Spectroscopy

  • DS/EN 13273:2001 Surface active agents - Determination of the content of non-ionic substances in anionic surface active agents by high performance liquid chromatograph (HPLC)

Lithuanian Standards Office , Surface Atomic Energy Spectroscopy

  • LST EN 13273-2002 Surface active agents - Determination of the content of non-ionic substances in anionic surface active agents by high performance liquid chromatography (HPLC)

ES-UNE, Surface Atomic Energy Spectroscopy

  • UNE-EN 13273:2002 Surface active agents - Determination of the content of non-ionic substances in anionic surface active agents by high performance liquid chromatography (HPLC).
  • UNE 84028:2021 Cosmetic raw materials. Determination of formaldehyde in anionic surfactants for cosmetic use.
  • UNE-EN 61010-2-061:2015 Safety requirements for electrical equipment for measurement, control and laboratory use - Part 2-061: Particular requirements for laboratory atomic spectrometers with thermal atomization and ionization (Endorsed by AENOR in June of 2015.)

Anhui Provincial Standard of the People's Republic of China, Surface Atomic Energy Spectroscopy

  • DB34/T 3370-2019 Determination of Free Chlorine and Bromine on the Surface of Printed Circuit Boards by Ion Chromatography

RO-ASRO, Surface Atomic Energy Spectroscopy

  • STAS SR ISO 7875-1:1996 Water quality - Determination of surfactants - Part 1. Determination of anionic surfactants by the methylene blue spectrometric method
  • STAS SR 13225-1995 Sludges resulting from the surface waters treatment and used waters purding. Determination of the lead content. Spectrometric method of atomic absorption.

AT-ON, Surface Atomic Energy Spectroscopy

European Committee for Standardization (CEN), Surface Atomic Energy Spectroscopy

  • EN 13273:2001 Surface Active Agents - Determination of the Content of Non-Ionic Substances in Anionic Surface Active Agents by High Performance Liquid Chromatography (HPLC)
  • prEN 60904-3-1993 Photovoltaic devices; part 3: measurement principles for terrestrial photovoltaic (PV) solar devices with reference spectral irradiance data (IEC 904-3:1989)
  • EN 13615:2001 Methods for the analysis of ingot tin - Determination of impurity element contents in tin grades 99,90 % and 99,85 % by atomic spectrometry

American National Standards Institute (ANSI), Surface Atomic Energy Spectroscopy

  • ANSI/ASTM F2569:2011 Test Method For Evaluating The Force Reduction Properties Of Surfaces For Athletic Use

GM North America, Surface Atomic Energy Spectroscopy

  • GM GMN10061-2003 Part Performance Requirements for Finishes of Electrical/Electronic Components

CZ-CSN, Surface Atomic Energy Spectroscopy

  • CSN 64 0805-1966 Determination of apparent density f moulding materials lhát cannot e poured írora a funncl

Professional Standard - Light Industry, Surface Atomic Energy Spectroscopy

  • QB/T 4969-2016 Surface active agents.Determination of cationic surfactant in raw materials and formulated products.Potentiometric titration method
  • QB/T 4970-2016 Surface active agents.Determination of anionic surfactant in raw materials and formulated products.Potentiometric titration method

BE-NBN, Surface Atomic Energy Spectroscopy

  • NBN-ISO 2272:1990 Surface active agents - Soaps - Determination of low contents of free glycerol by molecular absorption spectrometry
  • NBN T 63-161-1988 Surface active agents - Technical straight-chain sodium alkylbenzene sulfonates - Determination of mean relative molecular mass by gas-liquid chromatography

Guangdong Provincial Standard of the People's Republic of China, Surface Atomic Energy Spectroscopy

  • DB44/T 1216-2013 Characterization of graphene using scanning electron microscopy and X-ray spectroscopy
  • DB44/T 1215-2013 Characterization of Single-Walled Carbon Nanotubes Using Scanning Electron Microscopy and Energy Spectroscopy

国家质量监督检验检疫总局, Surface Atomic Energy Spectroscopy

  • SN/T 4484-2016 Rapid screening method for nickel release on the surface of imported and exported textile and clothing accessories Energy spectrometry

Society of Automotive Engineers (SAE), Surface Atomic Energy Spectroscopy

  • SAE AMS3603A-2002 (R) Protective Film, High Performance, Polymeric Pressure Sensitive Adhesive, for Aircraft Exterior Applications
  • SAE GEIASTD0005_3A-2018 Performance Testing for Aerospace and High Performance Electronic Interconnects Containing Pb-free Solder and Finishes
  • SAE GEIAHB0005_2-2016 Technical Guidelines for Aerospace and High Performance Electronic Systems Containing Lead-free Solder and Finishes

Professional Standard - Commodity Inspection, Surface Atomic Energy Spectroscopy

  • SN/T 4240-2015 Electrical and electronic products.Determination of lead and cadmium in metal parts surface nickel-plated.Inductively coupled plasma mass spectrometry

TR-TSE, Surface Atomic Energy Spectroscopy

  • TS 1848-1975 DETERMINATION OF FLOCCULATION PREVENTING POWER OF SURFACE ACTIVE AGENTS ?N THE PRESENCE OF VAT ACIDS

International Electrotechnical Commission (IEC), Surface Atomic Energy Spectroscopy

  • IEC 61010-2-061:2015 Safety requirements for electrical equipment for measurement, control, and laboratory use - Part 2-061: Particular requirements for laboratory atomic spectrometers with thermal atomization and ionization
  • IEC 61010-2-061:2018 Safety requirements for electrical equipment for measurement, control, and laboratory use - Part 2-061: Particular requirements for laboratory atomic spectrometers with thermal atomization and ionization
  • IEC 61010-2-061:1995 Safety requirements for electrical equipment for measurement, control, and laboratory use - Part 2-061: Particular requirements for laboratory atomic spectrometers with thermal atomization and ionization
  • IEC 61010-2-061:2003 Safety requirements for electrical equipment for measurement, control, and laboratory use - Part 2-061: Particular requirements for laboratory atomic spectrometers with thermal atomization and ionization
  • IEC 61010-2-061:2005 Safety requirements for electrical equipment for measurement, control, and laboratory use - Part 2-061: Particular requirements for laboratory atomic spectrometers with thermal atomization and ionization

TH-TISI, Surface Atomic Energy Spectroscopy

  • TIS 2010-2000 Safety requirements for electrical equipment for measurement, control and laboratory use.part 2-061: particular requirements for laboratory atomic spectrometers with thermal atomization and ionization

Underwriters Laboratories (UL), Surface Atomic Energy Spectroscopy

  • UL 61010A-2-061-2002 UL Standard for Safety Electrical Equipment for Laboratory Use; Part 2: Particular Requirements for Laboratory Atomic Spectrometers with Thermal Atomization and Ionization (First Edition)

Guangxi Provincial Standard of the People's Republic of China, Surface Atomic Energy Spectroscopy

  • DB45/T 2108-2019 Determination of Gallium Content in Target Materials for Copper Indium Gallium Selenium Solar Photovoltaic Cells by Inductively Coupled Plasma Atomic Emission Spectrometry

VN-TCVN, Surface Atomic Energy Spectroscopy

  • TCVN 6335-1998 Surface active agents.Technical straight.chain sodium alkylbenzenesulfonates.Determination of mean relative molecular mass by gas.liquid chromatography

The American Road & Transportation Builders Association, Surface Atomic Energy Spectroscopy

  • AASHTO TP 95-2011 Standard Method of Test for Surface Resistivity Indication of Concrete鈥檚 Ability to Resist Chloride Ion Penetration
  • AASHTO T 358-2015 Standard Method of Test for Surface Resistivity Indication of Concrete’s Ability to Resist Chloride Ion Penetration
  • AASHTO T 358-2017 Standard Method of Test for Surface Resistivity Indication of Concrete��s Ability to Resist Chloride Ion Penetration
  • AASHTO T 358-2021 Standard Method of Test for Surface Resistivity Indication of Concrete’s Ability to Resist Chloride Ion Penetration
  • AASHTO TP 95-2014 Standard Method of Test for Surface Resistivity Indication of Concrete’s Ability to Resist Chloride Ion Penetration

AASHTO - American Association of State Highway and Transportation Officials, Surface Atomic Energy Spectroscopy

  • TP 95-2011 Standard Method of Test for Surface Resistivity Indication of Concrete’s Ability to Resist Chloride Ion Penetration
  • TP 95-2014 Standard Method of Test for Surface Resistivity Indication of Concrete’s Ability to Resist Chloride Ion Penetration
  • T 358-2017 Standard Method of Test for Surface Resistivity Indication of Concrete’s Ability to Resist Chloride Ion Penetration
  • T 358-2015 Standard Method of Test for Surface Resistivity Indication of Concrete’s Ability to Resist Chloride Ion Penetration

ES-AENOR, Surface Atomic Energy Spectroscopy

ESDU - Engineering Sciences Data Unit, Surface Atomic Energy Spectroscopy

  • SPB-M6-2-2010 Apr.08: Colloidal Interactions Between Asphaltene and Different Surfaces Measured by Atomic force microscopy (AFM)

Professional Standard - Nuclear Industry, Surface Atomic Energy Spectroscopy

  • EJ/T 20150.30-2018 Post-irradiation inspection of PWR rod-bundle fuel assemblies—Part 30: Measurement of Fe, Ni, Cr, Mn, Si, Cu element content in fuel cladding surface deposits by atomic emission spectrometry




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