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total reflection x
total reflection x, Total:20 items.
In the international standard classification, total reflection x involves: Analytical chemistry, Testing of metals, Semiconducting materials.
German Institute for Standardization, total reflection x
- DIN 51003:2004 Total reflection x-ray fluorescence - Principles and definitions
Japanese Industrial Standards Committee (JISC), total reflection x
- JIS K 0181:2021 Surface chemical analysis -- Total reflection X-ray fluorescence analysis of water
International Organization for Standardization (ISO), total reflection x
- ISO 20289:2018 Surface chemical analysis - Total reflection X-ray fluorescence analysis of water
- ISO/TS 18507:2015 Surface chemical analysis - Use of Total Reflection X-ray Fluorescence spectroscopy in biological and environmental analysis
- ISO 17331:2004 Surface chemical analysis - Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
British Standards Institution (BSI), total reflection x
- BS ISO 20289:2018 Surface chemical analysis. Total reflection X-ray fluorescence analysis of water
- PD ISO/TS 18507:2015 Surface chemical analysis. Use of Total Reflection X-ray Fluorescence spectroscopy in biological and environmental analysis
- BS PD ISO/TS 18507:2015 Surface chemical analysis. Use of Total Reflection X-ray Fluorescence spectroscopy in biological and environmental analysis
- BS ISO 14706:2000 Surface chemical analysis - Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
- BS ISO 14706:2014 Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
- BS ISO 14706:2001 Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
- BS ISO 17331:2004+A1:2010 Surface chemical analysis. Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China, total reflection x
- GB/T 42360-2023 Total Reflection X-ray Fluorescence Spectroscopic Analysis of Water for Surface Chemical Analysis
- GB/T 24578-2015 Test method for measuring surface metal contamination on silicon wafers by total reflection X-Ray fluorescence spectroscopy
- GB/T 24578-2009 Test method for measuring surface metal contamination on silicon wafers by total reflection X-ray fluorescence spectroscopy
- GB/T 30701-2014 Surface chemical analysis.Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
Korean Agency for Technology and Standards (KATS), total reflection x
国家市场监督管理总局、中国国家标准化管理委员会, total reflection x
- GB/T 40110-2021 Surface chemical analysis—Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
KR-KS, total reflection x