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total reflection x fluorescence

total reflection x fluorescence, Total:14 items.

In the international standard classification, total reflection x fluorescence involves: Testing of metals, Semiconducting materials, Analytical chemistry.

General Administration of Quality Supervision, Inspection and Quarantine of the People‘s Republic of China, total reflection x fluorescence

• GB/T 24578-2015 Test method for measuring surface metal contamination on silicon wafers by total reflection X-Ray fluorescence spectroscopy
• GB/T 24578-2009 Test method for measuring surface metal contamination on silicon wafers by total reflection X-ray fluorescence spectroscopy
• GB/T 42360-2023 Total Reflection X-ray Fluorescence Spectroscopic Analysis of Water for Surface Chemical Analysis

German Institute for Standardization, total reflection x fluorescence

• DIN 51003:2004 Total reflection x-ray fluorescence - Principles and definitions

Japanese Industrial Standards Committee (JISC), total reflection x fluorescence

• JIS K 0181:2021 Surface chemical analysis -- Total reflection X-ray fluorescence analysis of water

International Organization for Standardization (ISO), total reflection x fluorescence

• ISO 20289:2018 Surface chemical analysis - Total reflection X-ray fluorescence analysis of water
• ISO/TS 18507:2015 Surface chemical analysis - Use of Total Reflection X-ray Fluorescence spectroscopy in biological and environmental analysis

British Standards Institution (BSI), total reflection x fluorescence

• BS ISO 20289:2018 Surface chemical analysis. Total reflection X-ray fluorescence analysis of water
• PD ISO/TS 18507:2015 Surface chemical analysis. Use of Total Reflection X-ray Fluorescence spectroscopy in biological and environmental analysis
• BS PD ISO/TS 18507:2015 Surface chemical analysis. Use of Total Reflection X-ray Fluorescence spectroscopy in biological and environmental analysis

国家市场监督管理总局、中国国家标准化管理委员会, total reflection x fluorescence

• GB/T 40110-2021 Surface chemical analysis—Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

Korean Agency for Technology and Standards (KATS), total reflection x fluorescence

• KS D ISO 14706-2003(2018)
• KS D ISO 14706:2003 Surface chemical analysis－Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence(TXRF) spectroscopy

KR-KS, total reflection x fluorescence

• KS D ISO 14706-2003(2023)

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